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Christopher L. Marshall - Chemical Sciences and Engineering Division, Argonne National Laboratory
Jan 18, 2017 - 3:15pm
Chemistry - Colloquia - 111 Robert A. Pritzker Science Center
Atomic layer deposition (ALD) is a thin film deposition technique based on the sequential use of a gas phase chemical process. ALD is a subclass of chemical vapor deposition. Through the repeated exposure to separate precursors, a thin film is slowly deposited. ALD is a key process in the... read more
Jan 18
Seth Darling
Jan 25, 2017 - 3:15pm
Chemistry - Colloquia - Pritzker Science Center Auditorium 111
Driven by climate change, population growth, development, urbanization, and other factors, water crises represent the greatest global risk in the coming decades. All sectors of society rely inherently on reliable supplies of clean water, and current practices are not sustainable. New technologies... read more
Jan 25